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Showing 1 match for the following: Inventor: "Huang, Wei" ×
Modeling an extreme ultraviolet lithography mask by a deep fully convolutional network
Unmet Need Extreme ultraviolet (EUV) lithography is a patterning method that is at the forefront of semiconductor fabrication technology. EUV lithography uses wavelengths of light that are as small as 13 nm to produce incredibly…